[Acquired by Synopsys, Inc.]
Process variability is inherent to IC design and manufacturing, however the impacts of process variations are increasing at each technology node. Traditional design methodologies cope with these variations by assuming worst case conditions. At 90-nm and below, designers are forced to use conservative guard-banding which sacrifices performance in order to control parametric yield. Extreme DA innovative technology enables precise analysis and optimization of parametric yield and design performance by accurately modeling systematic and random variations. Their solutions empower engineers to design for the full performance of their target technology node.